HO

Hilario Oh

AU Asml Us: 2 patents #1 of 20Top 5%
MIT: 2 patents #23 of 355Top 7%
SG Silicon Valley Group: 1 patents #2 of 17Top 15%
📍 Rochester, MI: #3 of 60 inventorsTop 5%
🗺 Michigan: #362 of 6,198 inventorsTop 6%
Overall (2002): #28,707 of 266,432Top 15%
3
Patents 2002

Issued Patents 2002

Showing 1–3 of 3 patents

Patent #TitleCo-InventorsDate
6476921 In-situ method and apparatus for end point detection in chemical mechanical polishing Nannaji Saka, Jamie Nam 2002-11-05
6458013 Method of chemical mechanical polishing Nannaji Saka, Jiun-Yu Lai 2002-10-01
6418356 Method and apparatus for resolving conflicts in a substrate processing system 2002-07-09