YW

Yuichi Wada

Applied Materials: 2 patents #201 of 912Top 25%
📍 Toyama, JP: #15 of 144 inventorsTop 15%
Overall (2002): #33,511 of 266,432Top 15%
2
Patents 2002

Issued Patents 2002

Showing 1–2 of 2 patents

Patent #TitleCo-InventorsDate
6488984 Film deposition method and apparatus Hiroyuki Yarita, Hisashi Aida, Naomi Yoshida 2002-12-03
6440282 Sputtering reactor and method of using an unbalanced magnetron Hisashi Aida, Kihwan Yoon 2002-08-27