Issued Patents 2002
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6491978 | Deposition of CVD layers for copper metallization using novel metal organic chemical vapor deposition (MOCVD) precursors | — | 2002-12-10 |
| 6475902 | Chemical vapor deposition of niobium barriers for copper metallization | Gilbert Hausmann, Vijay D. Parkhe | 2002-11-05 |