SS

Scott R. Summerfelt

TI Texas Instruments: 17 patents #2 of 720Top 1%
Caltech: 1 patents #14 of 121Top 15%
📍 Garland, TX: #1 of 91 inventorsTop 2%
🗺 Texas: #2 of 5,943 inventorsTop 1%
Overall (1997): #89 of 185,788Top 1%
17
Patents 1997

Issued Patents 1997

Showing 1–17 of 17 patents

Patent #TitleCo-InventorsDate
5696018 Method of forming conductive noble-metal-insulator-alloy barrier layer for high-dielectric-constant material electrodes Jason Reid, Marc Nicolet, Elzbieta Kolawa 1997-12-09
5679980 Conductive exotic-nitride barrier layer for high-dielectric-constant material electrodes 1997-10-21
5665628 Method of forming conductive amorphous-nitride barrier layer for high-dielectric-constant material electrodes 1997-09-09
5656852 High-dielectric-constant material electrodes comprising sidewall spacers Yasushiro Nishioka, Kyung-Ho Park, Pijush Bhattacharya 1997-08-12
5654580 Semiconductor structure for fabrication of a thermal sensor Howard R. Beratan, James F. Belcher 1997-08-05
5650646 Pb/Bi-containing high-dielectric constant oxides using a non-Pb/Bi-containing perovskite as a buffer layer 1997-07-22
5647946 Structure and method including dry etching techniques for forming an array of thermal sensitive elements James F. Belcher, Howard R. Beratan 1997-07-15
5643033 Method of making an anode plate for use in a field emission device Bruce E. Gnade, Daron Evans, Jules D. Levine 1997-07-01
5638599 Method of fabricating hybrid uncooled infrared detectors Howard R. Beratan, Chih-Chen Cho 1997-06-17
5626906 Electrodes comprising conductive perovskite-seed layers for perovskite dielectrics Howard R. Beratan 1997-05-06
5626773 Structure and method including dry etching techniques for forming an array of thermal sensitive elements James F. Belcher, Howard R. Beratan 1997-05-06
5622893 Method of forming conductive noble-metal-insulator-alloy barrier layer for high-dielectric-constant material electrodes Jason Reid, Marc Nicolet, Elzbieta Kolawa 1997-04-22
5619393 High-dielectric-constant material electrodes comprising thin ruthenium dioxide layers Howard R. Beratan, Bruce E. Gnade 1997-04-08
5612574 Semiconductor structures using high-dielectric-constant materials and an adhesion layer Howard R. Beratan 1997-03-18
5609927 Processing methods for high-dielectric-constant materials Howard R. Beratan, Robert Tsu 1997-03-11
5605858 Method of forming high-dielectric-constant material electrodes comprising conductive sidewall spacers of same material as electrodes Yasushiro Nishioka, Kyung-Ho Park, Pijush Bhattacharya 1997-02-25
5603848 Method for etching through a substrate to an attached coating Howard R. Beratan, James F. Belcher 1997-02-18