Issued Patents 1997
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5690781 | Plasma processing apparatus for manufacture of semiconductor devices | Kazuyoshi Yoshida | 1997-11-25 |
| 5645683 | Etching method for etching a semiconductor substrate having a silicide layer and a polysilicon layer | — | 1997-07-08 |