Issued Patents 1997
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5662770 | Method and apparatus for improving etch uniformity in remote source plasma reactors with powered wafer chucks | — | 1997-09-02 |
| 5651856 | Selective etch process | David J. Keller | 1997-07-29 |