Issued Patents 1997
Showing 1–15 of 15 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5698468 | Silicidation process with etch stop | — | 1997-12-16 |
| 5674774 | Method of making self-aligned remote polysilicon contacts | Nicholas F. Pasch, Richard Schinella | 1997-10-07 |
| 5670393 | Method of making combined metal oxide semiconductor and junction field effect transistor device | — | 1997-09-23 |
| 5663590 | Product of process for formation of vias (or contact openings) and fuses in the same insulation layer with minimal additional steps | — | 1997-09-02 |
| 5663076 | Automating photolithography in the fabrication of integrated circuits | Michael D. Rostoker, Nicholas F. Pasch | 1997-09-02 |
| 5656850 | "Microelectronic integrated circuit including hexagonal semiconductor ""and"" g" | — | 1997-08-12 |
| 5654563 | "Microelectronic integrated circuit including triangular semiconductor ""or"" g" | Michael D. Rostoker, James S. Koford, Ranko Scepanovic, Edwin R. Jones, Gobi R. Padmanahben +4 more | 1997-08-05 |
| 5650653 | "Microelectronic integrated circuit including triangular CMOS ""nand"" gate device" | Michael D. Rostoker, James S. Koford, Ranko Scepanovic, Edwin R. Jones, Gobi R. Padmanahben +4 more | 1997-07-22 |
| 5650648 | Integrated circuit structure having floating electrode with discontinuous phase of metal silicide formed on a surface thereof and process for making same | — | 1997-07-22 |
| 5644152 | Conductive germanium/silicon member with a roughened surface thereon suitable for use in an integrated circuit structure | Michael D. Rostoker | 1997-07-01 |
| 5640049 | Metal interconnect structures for use with integrated circuit devices to form integrated circuit structures | Michael D. Rostoker | 1997-06-17 |
| 5631581 | "Microelectronic integrated circuit including triangular semiconductor ""and"" gate device" | Michael D. Rostoker, James S. Koford, Ranko Scepanovic, Edwin R. Jones, Gobi R. Padmanahben +4 more | 1997-05-20 |
| 5631176 | Method of making combined JFET & MOS transistor device | — | 1997-05-20 |
| 5614428 | Process and structure for reduction of channeling during implantation of source and drain regions in formation of MOS integrated circuit structures | — | 1997-03-25 |
| 5598026 | Low dielectric constant insulation layer for integrated circuit structure and method of making same | Nicholas F. Pasch | 1997-01-28 |