MI

Mina Ishida

HI Hitachi: 1 patents #867 of 2,942Top 30%
HC Hitachi Chemical Company: 1 patents #27 of 99Top 30%
Overall (1997): #103,707 of 185,788Top 60%
1
Patents 1997

Issued Patents 1997

Showing 1–1 of 1 patents

Patent #TitleCo-InventorsDate
5633112 Photosensitive resin composition containing a carboxylic acid polymer, photoacid generator and secondary or tertiary aliphatic amine Takao Miwa, Yoshiaki Okabe, Akio Takahashi, Shunichi Numata 1997-05-27