Issued Patents 1997
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5693145 | Apparatus of formation of chemically amplified resist pattern | Hiroyuki Tanaka, Hideyuki Matsuda | 1997-12-02 |
| 5688628 | Resist composition | Masayuki Oie, Nobunori Abe, Hideyuki Tanaka, Shuichi Miyata | 1997-11-18 |