Issued Patents 1997
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5667597 | Polycrystalline silicon semiconductor having an amorphous silicon buffer layer | — | 1997-09-16 |
| 5645947 | Silicon-containing deposited film | Masaaki Hirooka, Kyosuke Ogawa, Isamu Shimizu | 1997-07-08 |
| 5644145 | Process for the formation of an amorphous silicon deposited film with intermittent irradiation of inert gas plasma | — | 1997-07-01 |