Issued Patents 1994
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5356753 | Positive resist material | Motoyuki Yamada, Osamu Watanabe, Hiroshi Ban, Yoshio Kawai | 1994-10-18 |
| 5290899 | Photosensitive material having a silicon-containing polymer | Masazumi Hasegawa | 1994-03-01 |