Issued Patents 1994
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5377309 | Software work tool | Ayumi Ishizaki, Tatsuo Kondoh | 1994-12-27 |
| 5366849 | Photoresist pattern formation through etching where the imaging exposure changes in a given direction in the desired pattern and inclined vapor deposition is utilized to deposit a film | Yoshikazu Nakagawa | 1994-11-22 |