Issued Patents 1994
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5362606 | Positive resist pattern formation through focused ion beam exposure and surface barrier silylation | John Melngailis, David C. Shaver | 1994-11-08 |
| 5318870 | Method of patterning a phenolic polymer film without photoactive additive through exposure to high energy radiation below 225 nm with subsequent organometallic treatment and the associated imaged article | — | 1994-06-07 |