Issued Patents 1994
Showing 1–6 of 6 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5342739 | Method of preparing a negative pattern utilizing photosensitive polymer composition containing quinonediazide compound and a poly(amido)imide precursor | Kouichi Katou, Hirotoshi Maeda | 1994-08-30 |
| 5326792 | Polyimide photosensitive cover coating agent | Yoshinori Masaki, Hirotoshi Maeda | 1994-07-05 |
| 5320935 | Method of forming a pattern from a photosensitive heat-resistant poly(amide)imide having hydroxyphenyl groups | Hirotoshi Maeda | 1994-06-14 |
| 5300627 | Adhesive polyimide film | Yoshihiro Soeda, Setsuo Itami, Kazutsune Kikuta | 1994-04-05 |
| 5298359 | Photosensitive heat-resistant polymer having hydroxyphenyl group for forming a patterned image | Hirotoshi Maeda | 1994-03-29 |
| 5294696 | Process for producing polyisoimide | Hirotoshi Maeda | 1994-03-15 |