Issued Patents 1994
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5318876 | Radiation-sensitive mixture containing acid-labile groups and production of relief patterns | Reinhold Schwalm, Dirk Funhoff | 1994-06-07 |
| 5300400 | Process for the production of relief patterns and images utilizing an organic compound having at least one acid-cleavable group and a storage stability improving amount of a second organic compound | Reinhold Schwalm | 1994-04-05 |