CS

Chester A. Szwejkowski

Applied Materials: 2 patents #17 of 123Top 15%
SE Seiko Epson: 1 patents #66 of 308Top 25%
📍 Dobbs Ferry, NY: #1 of 16 inventorsTop 7%
🗺 New York: #747 of 7,004 inventorsTop 15%
Overall (1994): #36,707 of 165,921Top 25%
2
Patents 1994

Issued Patents 1994

Showing 1–2 of 2 patents

Patent #TitleCo-InventorsDate
5338398 Tungsten silicide etch process selective to photoresist and oxide Robert Lum, Thierry Fried 1994-08-16
5296093 Process for removal of residues remaining after etching polysilicon layer in formation of integrated circuit structure Ian Latchford, Isamu Namose, Kazumi Tsuchida 1994-03-22