PP

Paul A. Perron

IP International Paper: 2 patents #3 of 34Top 9%
📍 Springfield, MA: #1 of 24 inventorsTop 5%
🗺 Massachusetts: #299 of 3,963 inventorsTop 8%
Overall (1994): #23,206 of 165,921Top 15%
2
Patents 1994

Issued Patents 1994

Showing 1–2 of 2 patents

Patent #TitleCo-InventorsDate
5340681 Method for preparing photographic elements having single photosensitive layer containing photopolymerizable compound, photoinitiator, diazonium compound and barrier material encapsulated pigment particles; and negative image formation process Maria T. Sypek, Gary V. Grosclaude 1994-08-23
5286594 Photographic elements utilizing a single photosensitive layer containing a photopolymerizable compound, photoinitiator, diazonium compound and barrier material encapsulated pigment particles Maria T. Sypek, Gary V. Grosclaude 1994-02-15