Issued Patents 1989
Showing 1–5 of 5 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 4879255 | Method for fabricating bipolar-MOS devices | Tatsuya Deguchi | 1989-11-07 |
| 4876219 | Method of forming a heteroepitaxial semiconductor thin film using amorphous buffer layers | Takashi Eshita, Yuji Furumura, Takuya Watanabe | 1989-10-24 |
| 4855254 | Method of growing a single crystalline .beta.-SiC layer on a silicon substrate | Takashi Eshita, Yuji Furumura, Kikuo Itoh | 1989-08-08 |
| 4825809 | Chemical vapor deposition apparatus having an ejecting head for ejecting a laminated reaction gas flow | — | 1989-05-02 |
| 4804560 | Method of selectively depositing tungsten upon a semiconductor substrate | Yoshimi Shioya, Yasushi Oyama, Norihisa Tsuzuki, Mamoru Maeda, Masaaki Ichikawa +6 more | 1989-02-14 |