Issued Patents 1989
Showing 1–4 of 4 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 4877711 | Light-sensitive diazo photopolymerizable composition with polyurethane having carbon-carbon unsaturated and a carboxyl group | Kazuo Maemoto, Akihiko Kamiya, Hiroshi Misu | 1989-10-31 |
| 4842986 | Positively working resist material | Nobuaki Matsuda, Tadayoshi Kokubo, Akira Umehara, Yoshimasa Aotani | 1989-06-27 |
| 4820607 | Photosolubilizable composition | — | 1989-04-11 |
| 4816375 | Photosolubilizable composition with silyl ether or silyl ester compound | — | 1989-03-28 |