Issued Patents 1989
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 4890239 | Lithographic process analysis and control system | Christopher P. Ausschnitt, Edward A. McFadden | 1989-12-26 |
| 4874240 | Characterization of semiconductor resist material during processing | Michael Watts, Thiloma I. Perera, David W. Myers, Robert G. Ozarski, John F. Schipper | 1989-10-17 |
| 4857738 | Absorption measurements of materials | David W. Myers, Robert G. Ozarski, Thiloma I. Perera, John F. Schipper, Michael Watts | 1989-08-15 |