Issued Patents All Time
Showing 25 most recent of 26 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7265058 | Method of manufacturing semiconductor device | — | 2007-09-04 |
| 6835651 | Wiring forming method | Hiroshi Nakaya | 2004-12-28 |
| 6509261 | Wiring forming method | Hiroshi Nakaya | 2003-01-21 |
| 6348404 | Wiring forming method | Hiroshi Nakaya | 2002-02-19 |
| 6197689 | Semiconductor manufacture method with aluminum wiring layer patterning process | — | 2001-03-06 |
| 6187689 | Manufacture of semiconductor device with fine patterns | — | 2001-02-13 |
| 6150250 | Conductive layer forming method using etching mask with direction <200> | Satoshi Hibino | 2000-11-21 |
| 6147003 | Method of manufacturing semiconductor device | Hiroshi Naito | 2000-11-14 |
| 6137175 | Semiconductor device with multi-layer wiring | — | 2000-10-24 |
| 6114182 | Measurement of electron shading damage | — | 2000-09-05 |
| 6080681 | Method of forming wiring pattern | — | 2000-06-27 |
| 6008132 | Dry etching suppressing formation of notch | — | 1999-12-28 |
| 5998300 | Method of manufacturing a semiconductor device using antireflection coating | — | 1999-12-07 |
| 5940682 | Method of measuring electron shading damage | — | 1999-08-17 |
| 5910021 | Manufacture of semiconductor device with fine pattens | — | 1999-06-08 |
| 5904490 | Method of measuring electron shading damage | — | 1999-05-18 |
| 5786637 | Interconnection with metal plug and reduced step | — | 1998-07-28 |
| 5767015 | Metal plug with adhesion layer | — | 1998-06-16 |
| 5707883 | Method for manufacturing a semiconductor device using antireflection coating | — | 1998-01-13 |
| 5686363 | Controlled taper etching | — | 1997-11-11 |
| 5670422 | Method of forming an interconnection with metal plug and reduced step | — | 1997-09-23 |
| 5639341 | Dry etching with less particles | — | 1997-06-17 |
| 5519254 | Multilayer aluminum wiring in semiconductor IC | — | 1996-05-21 |
| 5514621 | Method of etching polysilicon using a thin oxide mask formed on the polysilicon while doping | — | 1996-05-07 |
| 5451293 | Method of making a wiring layer wherein the masking material is ashed using an alcohol containing plasma | — | 1995-09-19 |