HK

Huiman Kang

WARF: 5 patents #366 of 4,123Top 9%
HB Hgst Netherlands, B.V.: 1 patents #510 of 972Top 55%
WT Western Digital Technologies: 1 patents #1,787 of 3,180Top 60%
📍 Madison, WI: #979 of 4,527 inventorsTop 25%
🗺 Wisconsin: #9,054 of 40,088 inventorsTop 25%
Overall (All Time): #993,707 of 4,157,543Top 25%
5
Patents All Time

Issued Patents All Time

Showing 1–5 of 5 patents

Patent #TitleCo-InventorsDate
10438626 Density multiplication and improved lithography by directed block copolymer assembly Paul Franklin Nealey, Francois Detcheverry, Juan Jose de Pablo, Ricardo Ruiz, Thomas R. Albrecht 2019-10-08
9718250 Directed assembly of block copolymer films between a chemically patterned surface and a second surface Paul Franklin Nealey, Guoliang Liu, Hiroshi Yoshida, Yashuhiko Tada, Juan Jose de Pablo +1 more 2017-08-01
9183870 Density multiplication and improved lithography by directed block copolymer assembly Paul Franklin Nealey, Francois Detcheverry, Juan Jose de Pablo, Ricardo Ruiz, Thomas R. Albrecht 2015-11-10
8501304 Methods and compositions for forming patterns with isolated or discrete features using block copolymer materials Mark Stoykovich, Konstantinos C. Daoulas, Juan Jose de Pablo, Marcus S. Muller, Paul Franklin Nealey 2013-08-06
8133534 Methods and compositions for forming patterns with isolated or discrete features using block copolymer materials Mark Stoykovich, Konstantinos C. Daoulas, Juan Jose de Pablo, Marcus S. Muller, Paul Franklin Nealey 2012-03-13