GD

Gregory C. DeSalvo

UF US Air Force: 12 patents #319 of 16,312Top 2%
NG Northrop Grumman: 1 patents #859 of 2,250Top 40%
📍 Beavercreek, OH: #36 of 522 inventorsTop 7%
🗺 Ohio: #5,371 of 73,341 inventorsTop 8%
Overall (All Time): #356,067 of 4,157,543Top 9%
14
Patents All Time

Issued Patents All Time

Showing 1–14 of 14 patents

Patent #TitleCo-InventorsDate
6884717 Stiffened backside fabrication for microwave radio frequency wafers Tony K. Quach, John L. Ebel, Anders P. Walker, Paul D. Cassity 2005-04-26
6657525 Microelectromechanical RF switch Lawrence E. Dickens, Fred E. Sacks, Howard Fudem, Don E. Crockett, Frank A. Lindberg +1 more 2003-12-02
6653214 Measured via-hole etching Tony K. Quach, G. David Via, James S. Sewell, Christopher A. Bozada, Ross W. Dettmer +4 more 2003-11-25
6222210 Complementary heterostructure integrated single metal transistor apparatus Charles L. A. Cerny, Christopher A. Bozada, John L. Ebel, Ross W. Dettmer, James K. Gillespie +7 more 2001-04-24
6198116 Complementary heterostructure integrated single metal transistor fabrication method Charles L. A. Cerny, Christopher A. Bozada, John L. Ebel, Ross W. Dettmer, James K. Gillespie +7 more 2001-03-06
6066865 Single layer integrated metal enhancement mode field-effect transistor apparatus Charles L. A. Cerny, Christopher A. Bozada, John L. Ebel, Ross W. Dettmer, James K. Gillespie +7 more 2000-05-23
6020226 Single layer integrated metal process for enhancement mode field-effect transistor Charles L. A. Cerny, Christopher A. Bozada, John L. Ebel, Ross W. Dettmer, James K. Gillespie +7 more 2000-02-01
6004881 Digital wet etching of semiconductor materials Christopher A. Bozada, John L. Ebel, Charles L. A. Cerny, Ross W. Dettmer, James K. Gillespie +7 more 1999-12-21
5976920 Single layer integrated metal process for high electron mobility transistor (HEMT) and pseudomorphic high electron mobility transistor (PHEMT) Kenichi Nakano, Christopher A. Bozada, Tony K. Quach, G. David Via, Ross W. Dettmer +4 more 1999-11-02
5940694 Field effect transistor process with semiconductor mask, single layer integrated metal, and dual etch stops Christopher A. Bozada, Tony K. Quach, Kenichi Nakano, G. David Via, Ross W. Dettmer +4 more 1999-08-17
5869364 Single layer integrated metal process for metal semiconductor field effect transistor (MESFET) Kenichi Nakano, Christopher A. Bozada, Tony K. Quach, G. David Via, Ross W. Dettmer +4 more 1999-02-09
5796131 Metal semiconductor field effect transistor (MESFET) device with single layer integrated metal Kenichi Nakano, Christopher A. Bozada, Tony K. Quach, G. David Via, Ross W. Dettmer +4 more 1998-08-18
5698870 High electron mobility transistor (HEMT) and pseudomorphic high electron mobility transistor (PHEMT) devices with single layer integrated metal Kenichi Nakano, Christopher A. Bozada, Tony K. Quach, G. David Via, Ross W. Dettmer +4 more 1997-12-16
5698900 Field effect transistor device with single layer integrated metal and retained semiconductor masking Christopher A. Bozada, Tony K. Quach, Kenichi Nakano, G. David Via, Ross W. Dettmer +4 more 1997-12-16