| 6664172 |
Method of forming a MOS transistor with improved threshold voltage stability |
Chung-Yi Chen |
2003-12-16 |
| 6635537 |
Method of fabricating gate oxide |
Shih-Chien Hsu, Chang-Chi Huang, Cheng-Tung Huang, Sheng-Hao Lin |
2003-10-21 |
| 6569726 |
Method of manufacturing MOS transistor with fluoride implantation on silicon nitride etching stop layer |
Terry Chen |
2003-05-27 |
| 6534354 |
Method of manufacturing MOS transistor with fluorine implantation at a low energy |
Terry Chen |
2003-03-18 |
| 6300238 |
Method of fabricating node contact opening |
Terry Chen |
2001-10-09 |
| 6251737 |
Method of increasing gate surface area for depositing silicide material |
— |
2001-06-26 |
| 6228756 |
Method of manufacturing inter-metal dielectric layer |
— |
2001-05-08 |
| 6214741 |
Method of fabricating a bit line of flash memory |
— |
2001-04-10 |
| 6174782 |
Method of fabricating lower electrode of capacitor |
— |
2001-01-16 |
| 6169017 |
Method to increase contact area |
— |
2001-01-02 |
| 6150237 |
Method of fabricating STI |
— |
2000-11-21 |
| 6133091 |
Method of fabricating a lower electrode of capacitor |
Hsi-Mao Hsiao, Wen-Shan Wei, Chun-Lung Chen |
2000-10-17 |
| 6127228 |
Method of forming buried bit line |
— |
2000-10-03 |
| 6093600 |
Method of fabricating a dynamic random-access memory device |
Terry Chen |
2000-07-25 |
| 6090698 |
Fabrication method for an insulation structure having a low dielectric constant |
— |
2000-07-18 |
| 6069032 |
Salicide process |
— |
2000-05-30 |
| 6060361 |
Method for preventing dopant diffusion in dual gate device |
— |
2000-05-09 |
| 6043154 |
Method for manufacturing charge storage electrode |
— |
2000-03-28 |
| 5932333 |
Method for manufacturing charge storage electrode |
— |
1999-08-03 |