| 12148627 |
Method for forming semiconductor memory structure |
Hsin-Hung Chou, Tsung-Wei Lin |
2024-11-19 |
| 12119261 |
Semiconductor structure and manufacturing method of the same |
Chun-Hung Lin, Chung-Hsien Liu, Tz-Hau Guo, Yen-Jui Chu |
2024-10-15 |
| 11990365 |
Method for manufacturing semiconductor device |
Chang-Ju Ho, Ying-Hao Chen |
2024-05-21 |
| 11818884 |
Method for manufacturing non-volatile memory device |
Chien-Hsien Wu, Chun-Hung Lin, Yao-Ting Tsai |
2023-11-14 |
| 11798185 |
Image analysis system and image analysis method for obtaining object range |
Tung-Yu Wu, Chun-Yen Liao, Chun-Sheng Wu, Chao-Yi Huang |
2023-10-24 |
| 10658320 |
Semiconductor device including conductive structure |
Chun-Hung Lin, Yen-Jui Chu |
2020-05-19 |
| 10615046 |
Methods of forming semiconductor devices with flowable material for better planarization method |
Kun-Che Wu |
2020-04-07 |
| 9773842 |
Memory devices |
Tso-Hua Hung, Hsaio-Yu Lin, Bo-Lun Wu, Ting-Ying Shen |
2017-09-26 |
| 8022560 |
Overlay mark |
Min-Hung Chen |
2011-09-20 |
| 7598155 |
Method of manufacturing an overlay mark |
Min-Hung Chen |
2009-10-06 |
| 7223527 |
Immersion lithography process, and structure used for the same and patterning process |
Jan-Nan Oue |
2007-05-29 |
| 7008729 |
Method for fabricating phase mask of photolithography process |
Chii-Ming Shiah, Yu-Cheng Tung |
2006-03-07 |
| 6791668 |
Semiconductor manufacturing apparatus and method |
Yasuko Tabata |
2004-09-14 |
| 6544695 |
Photomask set for photolithographic operation |
Li-Ming Wang |
2003-04-08 |
| 6509137 |
Multilayer photoresist process in photolithography |
Li-Ming Wang |
2003-01-21 |
| 6465160 |
Method for preventing side-lobes in photolithography |
Li-Ming Wang |
2002-10-15 |
| 6413685 |
Method of reducing optical proximity effect |
Li-Mimg Wang |
2002-07-02 |