| 6281067 |
Self-aligned silicide process for forming silicide layer over word lines in DRAM and transistors in logic circuit region |
Sun-Chieh Chien, Jhy-Jeng Liu, Wei-Wu Liao |
2001-08-28 |
| 6258651 |
Method for forming an embedded memory and a logic circuit on a single substrate |
Jason Jenq |
2001-07-10 |
| 6153513 |
Method of fabricating self-aligned capacitor |
Chia-Wen Liang |
2000-11-28 |
| 6150218 |
Method for simutaneously forming bit-line contacts and node contacts |
Chia-Wen Liang |
2000-11-21 |
| 6096594 |
Fabricating method of a dynamic random access memory |
Kun-Chi Lin, Chia-Wen Liang |
2000-08-01 |
| 6080666 |
Method for increasing landing pad area |
Der-Yuan Wu |
2000-06-27 |
| 6030878 |
Method of fabricating a dynamic random access memory capacitor |
Chia-Hung Kao |
2000-02-29 |
| 6004846 |
Method for manufacturing DRAM capacitor using hemispherical grained silicon |
— |
1999-12-21 |
| 5940714 |
Method of fabricating a capacitor electrode structure in integrated circuit through self-aligned process |
Chia-Wen Liang |
1999-08-17 |