Issued Patents All Time
Showing 1–4 of 4 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5223376 | Method for producing fine patterns utilizing specific polymeric diazonium salt, or diazonium salt/sulfone group containing polymer, as photobleachable agent | Masazumi Hasegawa, Mitsutoshi Fukuda | 1993-06-29 |
| 5212043 | Photoresist composition comprising a non-aromatic resin having no aromatic structures derived from units of an aliphatic cyclic hydrocarbon and units of maleic anhydride and/or maleimide and a photosensitive agent | Takashi Yamamoto, Toru Seita, Kyoko Nagaoka, Kosaburo Matsumura | 1993-05-18 |
| 5202217 | Solubilization-inhibitor and positive resist composition | Takashi Taniguchi, Toru Seita, Shinji Sato, Katuya Shibata | 1993-04-13 |
| 4508877 | Process for producing a high purity cyclized polymer of isoprene | Hiroyuki Watanabe | 1985-04-02 |