TI

Toshihide Ieki

TC Toyo Seikan Co.: 5 patents #131 of 888Top 15%
Overall (All Time): #1,020,910 of 4,157,543Top 25%
5
Patents All Time

Issued Patents All Time

Showing 1–5 of 5 patents

Patent #TitleCo-InventorsDate
7906217 Vapor deposited film by plasma CVD method Hajime Inagaki, Satoru Kitou, Ryuta Nakano, Megumi Nakayama 2011-03-15
7847209 Method of forming a metal oxide film and microwave power source device used for the above method Tsunehisa Namiki, Hideo Kurashima, Hajime Inagaki, Akira Kobayashi, Koji Yamada 2010-12-07
7488683 Chemical vapor deposited film based on a plasma CVD method and method of forming the film Akira Kobayashi, Tsunehisa Namiki, Hiroko Hosono, Hideo Kurashima, Hajime Inagaki 2009-02-10
6818310 Silicon oxide film Tsunehisa Namiki, Hideo Kurashima, Hajime Inagaki, Akira Kobayashi, Koji Yamada +1 more 2004-11-16
6582778 Method of treatment with a microwave plasma Tsunehisa Namiki, Akira Kobayashi, Koji Yamada, Hideo Kurashima 2003-06-24