Issued Patents All Time
Showing 1–12 of 12 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6797452 | Photosensitive composition comprising photosensitive saponified poly(vinyl acetate) and pattern formation method making use of the composition | Masahiro Takano, Shin Utsunomiya, Nobuji Sakai | 2004-09-28 |
| 6444391 | Photosensitive compositions and pattern formation method | Masaharu Watanabe | 2002-09-03 |
| 6342330 | Photosensitive compositions and pattern formation method | Masaharu Watanabe, Hirotaka Tagoshi, Tetsuhiko Yamaguchi | 2002-01-29 |
| 6140007 | Photosensitive compositions and pattern formation method | Masaharu Watanabe, Yukari Imamura, Hideo Kikuchi | 2000-10-31 |
| 6140018 | Photosensitive resin and composition thereof derived from saponified poly(vinyl acetate) and pattern formation method | Mitsuharu Miyazaki, Takaho Ito | 2000-10-31 |
| 6020093 | Photosensitive compounds, photosensitive resin compositions, and pattern formation method making use of the compounds or compositions | Toru Shibuya, Jian Rong Xie | 2000-02-01 |
| 5866296 | Photosensitive resin composition | Toru Shibuya, Mitsuharu Miyazaki, Hideo Kikuchi | 1999-02-02 |
| 5807657 | Polyvinyl alcohol base photosensitive resin, photosensitive composition, and method for pattern-formation using the same | Hideo Kikuchi, Yasuo Kuniyoshi | 1998-09-15 |
| 5589315 | Photosensitive compositions comprising photosensitive polyfunctional aromatic diazo compounds, and presensitized lithographic plates formed with the same | Hirotada Iida, Yasuo Kuniyoshi, Masaharu Watanabe, Katsuyo Tokuda, Ichiro Hozumi | 1996-12-31 |
| 5430130 | Photosensitive polyfunctional aromatic diazo compounds useful in photosensitive compositions | Hirotada Iida, Yasuo Kuniyoshi, Masaharu Watanabe, Katsuyo Tokuda, Ichiro Hozumi | 1995-07-04 |
| 5041570 | Photosensitive 4,4'-diazidostilbene derivative | Hideo Kikuchi | 1991-08-20 |
| 5021505 | Photosensitive poly(vinyl alcohol) derivative | Kunihiro Ichimura, Hideo Kikuchi | 1991-06-04 |