Issued Patents All Time
Showing 1–6 of 6 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 4544624 | Photosensitive resin composition | Masaru Nanpei, Akira Tomita, Toshiaki Fujimura | 1985-10-01 |
| 4419438 | Image forming material and method | Toshikiyo Tanaka, Yoshio Katoh, Takeo Sugiura, Yoshiyasu Itoh, Takeo Kohira | 1983-12-06 |
| 4405705 | Photosensitive resin composition containing basic polymeric compounds and organic carboxylic acids | Masaru Nampei, Shinichi Tanaka | 1983-09-20 |
| 4220704 | Water soluble photosensitive resin compositions comprising a polyamide or its salt | Masaru Nanpei | 1980-09-02 |
| 4188221 | Photosensitive polyamide resin composition useful for making relief printing plate | Masaru Nanpei, Toshiaki Fujimura, Hajime Kouda, Yoshihiro Kasho | 1980-02-12 |
| 4187112 | Photosensitive plate containing nitrogen containing condensation type polyesters | Masaru Nanpei, Morio Miyagi | 1980-02-05 |