Issued Patents All Time
Showing 1–6 of 6 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5677380 | Planarizing material and planarizing method | Kosaburo Matsumura, Mitsumasa Akashi, Masazumi Hasegawa | 1997-10-14 |
| 5625018 | Process for producing chloroprene rubber | Takashi Yamamoto, Takeshi Hironaka, Tadashi Hayashi | 1997-04-29 |
| 5183722 | Positive photosensitive composition for forming lenses containing 1,2-naphthoquinone diazide sulfonate photosensitizer, alkali-soluble resin and thermosetting agent and process for producing the composition | Teruhisa Uemura, Masazumi Hasegawa | 1993-02-02 |
| 4983495 | Positive resist patterns | Toru Seita, Kousaburou Matsumura, Kyoko Nagaoka, Toshimitsu Yanagihara | 1991-01-08 |
| 4822721 | A method of image-wise exposing and developing halogen-containing polyacrylate derivatives | Toru Seita, Hideo Shuyama, Kousaburou Matsumura, Kyoko Nakazawa | 1989-04-18 |
| 4752635 | Halogen-containing polyacrylate derivatives | Toru Seita, Hideo Shuyama, Kousaburou Matsumura, Kyoko Nakazawa | 1988-06-21 |