Issued Patents All Time
Showing 1–10 of 10 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7754003 | Coating composition and low dielectric siliceous material produced by using same | Hiroyuki Aoki | 2010-07-13 |
| 7368491 | Phosphorus-containing silazane composition, phosphorus-containing siliceous film, phosphorus-containing siliceous filler, method for producing phosphorus-containing siliceous film, and semiconductor device | Hiroyuki Aoki | 2008-05-06 |
| 6767641 | Method for sealing fine groove with siliceous material and substrate having siliceous coating formed thereon | Yasuo Shimizu, Yuuji Tashiro | 2004-07-27 |
| 6746714 | Porous silica coating with low dielectric constant, semiconductor device and coating composition | Yasuo Shimizu | 2004-06-08 |
| 6310168 | Aminated polysilazane and process for the preparation thereof | Yasuo Shimizu, Osamu Funayama | 2001-10-30 |
| 5459114 | Method for producing ceramic products | Hiroshi Kaya, Kiyoshi Sato, Hiroki Morozumi, Atushi Tezuka, Hirohiko Nakahara +2 more | 1995-10-17 |
| 5436398 | Polymetalosilazane, process of producing same, silicon nitride based ceramic, and process of preparing same | Yasuo Shimizu, Hirohiko Nakahara, Osamu Funayama, Takeshi Isoda | 1995-07-25 |
| 5359114 | Silane compound and processes for the preparation thereof | Satoshi Ueki, Tadanao Kohara | 1994-10-25 |
| 5248803 | Silane compound and processes for the preparation thereof | Kunihiko Imanishi, Ryuji Sato, Satoshi Ueki, Yoshiharu Okumura, Tadanao Kohara | 1993-09-28 |
| 5142082 | Silane compound and processes for the preparation thereof | Ryuji Sato, Satoshi Ueki, Yoshiharu Okumura | 1992-08-25 |