Issued Patents All Time
Showing 1–17 of 17 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11677044 | Highly efficient gallium nitride based light emitting diodes via surface roughening | Tetsuo Fujii, Yan Gao, Shuji Nakamura | 2023-06-13 |
| 10985293 | Highly efficient gallium nitride based light emitting diodes via surface roughening | Tetsuo Fujii, Yan Gao, Shuji Nakamura | 2021-04-20 |
| 10446714 | Highly efficient gallium nitride based light emitting diodes via surface roughening | Tetsuo Fujii, Yan Gao, Shuji Nakamura | 2019-10-15 |
| 10211428 | Metal-based optical device enabling efficient light generation from emitters on a high-index absorbing substrate | Kasey J. Russell, Tsung-Li Liu | 2019-02-19 |
| 8865347 | Digital alloys and methods for forming the same | Angela M. Belcher, Xina Quan | 2014-10-21 |
| 8766296 | Highly efficient gallium nitride based light emitting diodes via surface roughening | Tetsuo Fujii, Yan Gao, Shuji Nakamura | 2014-07-01 |
| 8569085 | Photoelectrochemical etching for chip shaping of light emitting diodes | Adele Tamboli, James S. Speck | 2013-10-29 |
| 8263500 | Photoelectrochemical etching for laser facets | Adele Tamboli, Steven P. DenBaars, Arpan Chakraborty | 2012-09-11 |
| 8053264 | Photoelectrochemical etching of P-type semiconductor heterostructures | Adele Tamboli, Mathew C. Schmidt, Shuji Nakamura, Steven P. DenBaars | 2011-11-08 |
| 7960721 | Light emitting devices made by bio-fabrication | Angela M. Belcher, Xina Quan, Hash Pakbaz | 2011-06-14 |
| 7704763 | Highly efficient group-III nitride based light emitting diodes via fabrication of structures on an N-face surface | Tetsuo Fujii, Yan Gao, Shuji Nakamura | 2010-04-27 |
| 7550395 | Control of photoelectrochemical (PEC) etching by modification of the local electrochemical potential of the semiconductor structure relative to the electrolyte | Shuji Nakamura, Elaine D. Haberer, Rajat Sharma | 2009-06-23 |
| 6884740 | Photoelectrochemical undercut etching of semiconductor material | Andreas Stonas | 2005-04-26 |
| 5773369 | Photoelectrochemical wet etching of group III nitrides | Milan Singh Minsky | 1998-06-30 |
| 4370359 | Fabrication technique for junction devices | Linus Albert Fetter, Richard E. Howard, Lawrence David Jackel | 1983-01-25 |
| 4352870 | High resolution two-layer resists | Richard E. Howard, Lawrence David Jackel | 1982-10-05 |
| 4326911 | Reactive ion etching of III-V compounds including InP, GaAs-InP and GaAlAs | Richard E. Howard | 1982-04-27 |