Issued Patents All Time
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6686102 | Two-exposure phase shift photolithography with improved inter-feature separation | John N. Randall | 2004-02-03 |
| 4557797 | Resist process using anti-reflective coating | Yi-Ching Lin | 1985-12-10 |
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6686102 | Two-exposure phase shift photolithography with improved inter-feature separation | John N. Randall | 2004-02-03 |
| 4557797 | Resist process using anti-reflective coating | Yi-Ching Lin | 1985-12-10 |