Issued Patents All Time
Showing 1–1 of 1 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6051505 | Plasma etch method for forming metal-fluoropolymer residue free vias through silicon containing dielectric layers | Po-Tao Chu, Ming-Chieh Yeh, Fang Chen | 2000-04-18 |