Issued Patents All Time
Showing 1–14 of 14 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12172262 | Irregular mechanical motion detection systems and method | Yu-Chi Tsai, Chin Wei Chuang, Bo-An Chen, Sheng-Chen Wang, Chen-Hua Tsai | 2024-12-24 |
| 12115767 | Pad removal method and device | Sheng-Chen Wang | 2024-10-15 |
| 12070833 | Method of using polishing pad | Jung-Yu Li, Sheng-Chen Wang, Shih-Sian HUANG | 2024-08-27 |
| 12009221 | Performing planarization process controls in semiconductor fabrication | Sheng-Chen Wang, Chin Wei Chuang | 2024-06-11 |
| 11731232 | Irregular mechanical motion detection systems and method | Yu-Chi Tsai, Chin Wei Chuang, Bo-An Chen, Sheng-Chen Wang, Chen-Hua Tsai | 2023-08-22 |
| 11691243 | Method of using polishing pad | Jung-Yu Li, Sheng-Chen Wang, Shih-Sian HUANG | 2023-07-04 |
| 11679472 | Method for CMP pad conditioning | Sheng-Chen Wang | 2023-06-20 |
| 11554578 | Pad removal method | Sheng-Chen Wang | 2023-01-17 |
| 10987913 | Pad removal device and method | Sheng-Chen Wang | 2021-04-27 |
| 10864612 | Polishing pad and method of using | Jung-Yu Li, Sheng-Chen Wang, Shih-Sian HUANG | 2020-12-15 |
| 10675732 | Apparatus and method for CMP pad conditioning | Sheng-Chen Wang | 2020-06-09 |
| 10468270 | Performing planarization process controls in semiconductor fabrication | Sheng-Chen Wang, Chin Wei Chuang | 2019-11-05 |
| 10272661 | Pad removal device and method | Sheng-Chen Wang | 2019-04-30 |
| 10155297 | Chemical mechanical polishing head | Jerry Chen | 2018-12-18 |