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Oxide sintered body, sputtering target, and oxide semiconductor thin film obtained using sputtering target |
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2018-11-13 |
| 10000842 |
Oxide sintered body, sputtering target, and oxide semiconductor thin film obtained using sputtering target |
Tokuyuki Nakayama, Fumihiko Matsumura, Masashi Iwara |
2018-06-19 |
| 9941415 |
Oxide sintered body, sputtering target, and oxide semiconductor thin film obtained using sputtering target |
Tokuyuki Nakayama, Fumihiko Matsumura, Masashi Iwara |
2018-04-10 |
| 9768316 |
Oxide semiconductor thin film and thin film transistor |
Tokuyuki Nakayama, Masashi Iwara |
2017-09-19 |
| 9732004 |
Oxide sintered body, sputtering target, and oxide semiconductor thin film obtained using sputtering target |
Tokuyuki Nakayama, Fumihiko Matsumura, Masashi Iwara |
2017-08-15 |
| 9688580 |
Oxide sintered body, sputtering target, and oxide semiconductor thin film obtained using sputtering target |
Tokuyuki Nakayama, Fumihiko Matsumura, Masashi Iwara |
2017-06-27 |
| 9670578 |
Oxide sintered body, sputtering target, and oxide semiconductor thin film obtained using sputtering target |
Tokuyuki Nakayama, Fumihiko Matsumura, Masashi Iwara |
2017-06-06 |
| 9670577 |
Oxide sintered body, sputtering target, and oxide semiconductor thin film obtained using sputtering target |
Tokuyuki Nakayama, Fumihiko Matsumura, Masashi Iwara |
2017-06-06 |
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Oxynitride semiconductor thin film |
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Liquid crystal display apparatus and method for manufacturing same |
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Driving circuit for a liquid crystal display apparatus |
Ryuji Hashimoto, Shigeaki Mizushima, Shigehiro Minezaki, Toshio Takemoto |
1993-03-02 |
| 5066110 |
Liquid crystal display apparatus |
Shigeaki Mizushima, Seiji Fukami, Ryuji Hashimoto, Hisato Nagatomi, Michihisa Onishi +2 more |
1991-11-19 |
