KF

Katsuki Furukawa

Sharp Kabushiki Kaisha: 30 patents #451 of 10,731Top 5%
UN Unknown: 2 patents #12,644 of 83,584Top 20%
Overall (All Time): #126,086 of 4,157,543Top 4%
30
Patents All Time

Issued Patents All Time

Showing 1–25 of 30 patents

Patent #TitleCo-InventorsDate
6888867 Semiconductor laser device and fabrication method thereof Nobuhiko Sawaki, Yoshio Honda, Norifumi Kameshiro, Masahito Yamaguchi, Norikatsu Koide +2 more 2005-05-03
6635901 Semiconductor device including an InGaAIN layer Nobuhiko Sawaki, Yoshio Honda, Norikatsu Koide 2003-10-21
5804839 III-V nitride compound semiconductor device and method for fabricating the same Daisuke Hanaoka 1998-09-08
5693180 Dry etching method for a gallium nitride type compound semiconductor Satoshi Sugahara 1997-12-02
5433167 Method of producing silicon-carbide single crystals by sublimation recrystallization process using a seed crystal Yoshimitsu Tajima, Akira Suzuki 1995-07-18
5387804 Light emitting diode Akira Suzuki, Mitsuhiro Shigeta, Yoshihisa Fujii 1995-02-07
5329141 Light emitting diode Akira Suzuki, Yoshihisa Fujii, Hajime Saito, Yoshimitsu Tajima 1994-07-12
5319220 Silicon carbide semiconductor device Akira Suzuki, Mitsuhiro Shigeta, Yoshihisa Fujii, Atsuko Ogura 1994-06-07
5288365 Method for growing a silicon carbide single crystal Yoshimitsu Tajima, Akira Suzuki 1994-02-22
5279701 Method for the growth of silicon carbide single crystals Mitsuhiro Shigeta, Akira Suzuki, Yoshihisa Fujii 1994-01-18
5272107 Manufacture of silicon carbide (SiC) metal oxide semiconductor (MOS) device Akira Suzuki 1993-12-21
5243204 Silicon carbide light emitting diode and a method for the same Akira Suzuki, Yoshihisa Fujii 1993-09-07
5230768 Method for the production of SiC single crystals by using a specific substrate crystal orientation Akira Suzuki, Yoshihisa Fujii 1993-07-27
5229625 Schottky barrier gate type field effect transistor Akira Suzuki, Akitsugu Hatano, Atsuko Uemoto 1993-07-20
5216264 Silicon carbide MOS type field-effect transistor with at least one of the source and drain regions is formed by the use of a schottky contact Yoshihisa Fujii, Akira Suzuki, Mitsuhiro Shigeta 1993-06-01
5184199 Silicon carbide semiconductor device Yoshihisa Fujii, Akira Suzuki, Mitsuhiro Shigeta 1993-02-02
5170231 Silicon carbide field-effect transistor with improved breakdown voltage and low leakage current Yoshihisa Fujii, Akira Suzuki 1992-12-08
5135885 Method of manufacturing silicon carbide FETS Yoshihisa Fujii, Mitsuhiro Shigeta, Akira Suzuki 1992-08-04
5124779 Silicon carbide semiconductor device with ohmic electrode consisting of alloy Akira Suzuki, Yoshihisa Fujii 1992-06-23
5063421 Silicon carbide light emitting diode having a pn junction Akira Suzuki, Mitsuhiro Shigeta, Yoshihisa Fujii 1991-11-05
5049950 MIS structure photosensor Yoshihisa Fujii, Mitsuhiro Shigeta, Kenji Nakanishi, Atsuko Ogura 1991-09-17
5037502 Process for producing a single-crystal substrate of silicon carbide Akira Suzuki 1991-08-06
5030580 Method for producing a silicon carbide semiconductor device Akira Suzuki, Yoshihisa Fujii 1991-07-09
4990994 Electrode structure for silicon carbide semiconductors Akira Suzuki, Mitsuhiro Shigeta, Atsuko Uemoto 1991-02-05
4966860 Process for producing a SiC semiconductor device Akira Suzuki 1990-10-30