NY

Naoaki Yamaguchi

SL Semiconductor Energy Laboratory: 63 patents #154 of 1,113Top 15%
Sharp Kabushiki Kaisha: 3 patents #4,164 of 10,731Top 40%
2T 24M Technologies: 1 patents #50 of 64Top 80%
📍 Kagoshima, JP: #2 of 469 inventorsTop 1%
Overall (All Time): #34,905 of 4,157,543Top 1%
64
Patents All Time

Issued Patents All Time

Showing 51–64 of 64 patents

Patent #TitleCo-InventorsDate
5982460 Electro-optical display Hongyong Zhang, Yasuhiko Takemura 1999-11-09
5962872 Semiconductor device and method for fabricating the same Hongyong Zhang, Hideto Ohnuma, Yasuhiko Takemura 1999-10-05
5929948 Black matrix coupled to common electrode through a transparent conductive film Tatsuya Ohori, Michiko Takei, Hongyong Zhang, Hideomi Suzawa 1999-07-27
5926735 Method of forming semiconductor device Shunpei Yamazaki, Yuugo Goto, Satoshi Teramoto, Katunobu Awane, Yoshitaka Yamamoto +1 more 1999-07-20
5897346 Method for producing a thin film transistor Hongyong Zhang, Satoshi Teramoto, Hideto Ohnuma 1999-04-27
5815226 Electro-optical device and method of fabricating same Shunpei Yamazaki, Jun Koyama, Katunobu Awane, Fumiaki Funada, Yoshitaka Yamamoto 1998-09-29
5756364 Laser processing method of semiconductor device using a catalyst Koichiro Tanaka 1998-05-26
5736414 Method for manufacturing semiconductor device 1998-04-07
5648277 Method of manufacturing a semiconductor device Hongyong Zhang, Yasuhiko Takemura 1997-07-15
5620906 Method for producing semiconductor device by introducing hydrogen ions Hongyong Zhang, Satoshi Teramoto, Hideto Ohnuma 1997-04-15
5612250 Method for manufacturing a semiconductor device using a catalyst Hisashi Ohtani, Akiharu Miyanaga, Hongyong Zhang, Atsunori Suzuki 1997-03-18
5605846 Method for manufacturing semiconductor device Hisahi Ohtani, Akiharu Miyanaga, Hongyong Zhang 1997-02-25
5543352 Method for manufacturing a semiconductor device using a catalyst Hisashi Ohtani, Akiharu Miyanaga, Hongyong Zhang, Atsunori Suzuki 1996-08-06
5508209 Method for fabricating thin film transistor using anodic oxidation Hongyong Zhang, Hideto Ohnuma, Yasuhiko Takemura 1996-04-16