HO

Hisashi Ohtani

SL Semiconductor Energy Laboratory: 429 patents #11 of 1,113Top 1%
Sharp Kabushiki Kaisha: 5 patents #3,007 of 10,731Top 30%
📍 Tochigi, JP: #1 of 2,789 inventorsTop 1%
Overall (All Time): #535 of 4,157,543Top 1%
431
Patents All Time

Issued Patents All Time

Showing 401–425 of 431 patents

Patent #TitleCo-InventorsDate
5966596 Method of fabricating semiconductor devices by crystallizing amorphous silicon with nickel Toru Mitsuki 1999-10-12
5940690 Production method for a thin film semiconductor device with an alignment marker made out of the same layer as the active region Naoto Kusumoto, Yasuhiko Takemura 1999-08-17
5932893 Semiconductor device having doped polycrystalline layer Akiharu Miyanaga, Satoshi Teramoto 1999-08-03
5923997 Semiconductor device Akiharu Mitanaga, Satoshi Teramoto 1999-07-13
5923966 Laser processing method Satoshi Teramoto, Akiharu Miyanaga, Toshiji Hamatani, Shunpei Yamazaki 1999-07-13
5923962 Method for manufacturing a semiconductor device Akiharu Miyanaga, Takeshi Fukunaga, Hongyong Zhang 1999-07-13
5915174 Semiconductor device and method for producing the same Shunpei Yamazaki, Akiharu Miyanaga, Satoshi Teramoto 1999-06-22
5904770 Method of manufacturing a semiconductor device Akiharu Miyanaga, Junichi Takeyama 1999-05-18
5895933 Semiconductor device and method for its preparation Hongyong Zhang, Yasuhiko Takemura, Toru Takayama, Akiharu Miyanaga, Junichi Takeyama 1999-04-20
5894137 Semiconductor device with an active layer having a plurality of columnar crystals Shunpei Yamazaki, Takeshi Fukunaga 1999-04-13
5882960 Method of preparing a semiconductor having a controlled crystal orientation Hongyong Zhang, Toru Takayama, Yasuhiko Takemura, Akiharu Miyanaga, Junichi Takeyama 1999-03-16
5869362 Method of manufacturing semiconductor device 1999-02-09
5854096 Process for fabricating semiconductor device Takeshi Fukunaga, Akiharu Miyanaga 1998-12-29
5851862 Method of crystallizing a silicon film Yasuhiko Takemura, Akiharu Miyanaga, Shunpei Yamazaki 1998-12-22
5843833 Method for producing semiconductor device Takeshi Fukunaga, Akiharu Miyanaga 1998-12-01
5818076 Transistor and semiconductor device Hongyong Zhang, Toru Takayama, Yasuhiko Takemura, Akiharu Miyanaga 1998-10-06
5808321 Semiconductor device with recrystallized active area Akiharu Mitanaga, Satoshi Teramoto 1998-09-15
5795816 Method of fabricating semiconductor device Satoshi Teramoto, Akira Takenouchi 1998-08-18
5789284 Method for fabricating semiconductor thin film Shunpei Yamazaki, Akiharu Miyanaga, Satoshi Teramoto 1998-08-04
5789762 Semiconductor active matrix circuit Jun Koyama, Yasuhiko Takemura, Masahiko Hayakawa, Shunpei Yamazaki, Akiharu Miyanaga 1998-08-04
5705829 Semiconductor device formed using a catalyst element capable of promoting crystallization Akiharu Miyanaga, Yasuhiko Takemura 1998-01-06
5656825 Thin film transistor having crystalline semiconductor layer obtained by irradiation Naoto Kusumoto, Yasuhiko Takemura 1997-08-12
5654203 Method for manufacturing a thin film transistor using catalyst elements to promote crystallization Hiroki Adachi, Akiharu Miyanaga, Toru Takayama 1997-08-05
5643826 Method for manufacturing a semiconductor device Akiharu Miyanaga, Takeshi Fukunaga, Hongyong Zhang 1997-07-01
5612250 Method for manufacturing a semiconductor device using a catalyst Akiharu Miyanaga, Hongyong Zhang, Naoaki Yamaguchi, Atsunori Suzuki 1997-03-18