| D918256 |
Portion of a display panel or screen with a graphical user interface |
Satoshi Asai |
2021-05-04 |
| 7259071 |
Semiconductor device with dual gate oxides |
Inki Kim, Sang Yeon Kim, Min Paek, Chiew Sin Ping, Wan Gie Lee +3 more |
2007-08-21 |
| 7241665 |
Shallow trench isolation |
Inki Kim, Sang Yeon Kim, Min Paek, Ch'ng Toh Ghee, Ramakrishnan Rajagopal +6 more |
2007-07-10 |
| 7161198 |
Semiconductor integrated circuit device having MOS transistor |
Toshihiko Omi, Kazutoshi Ishii, Naoto Saitoh |
2007-01-09 |
| 7091104 |
Shallow trench isolation |
Inki Kim, Sang Yeon Kim, Min Paek, Ch'ng Toh Ghee, Ramakrishnan Rajagopal +6 more |
2006-08-15 |
| 7056836 |
Manufacturing method for a semiconductor device |
— |
2006-06-06 |
| 6818514 |
Semiconductor device with dual gate oxides |
Inki Kim, Sang Yeon Kim, Min Paek, Chiew Sin Ping, Wan Gie Lee +3 more |
2004-11-16 |
| 6680244 |
Method for manufacturing semiconductor device |
— |
2004-01-20 |
| 6656780 |
Method of manufacturing a semiconductor device having nitrogen ions by twice RTA processes |
— |
2003-12-02 |
| 6573557 |
EEPROM cell having reduced cell area |
— |
2003-06-03 |
| 6420222 |
Method of producing semiconductor having two-layer polycrystalline silicon structure |
— |
2002-07-16 |
| 5672906 |
Semiconductor device having defects of deep level generated by electron beam irradiation in a semiconductor substrate |
Yutaka Saito, Takao Akiba, Koju Nonaka, Masaaki Kamiya |
1997-09-30 |
| 5602408 |
Semiconductor device having polycrystalline silicon load devices |
Hiroaki Takasu |
1997-02-11 |