YW

Yukimune Watanabe

SE Seiko Epson: 14 patents #1,343 of 7,774Top 20%
RT Renesas Technology: 4 patents #758 of 3,337Top 25%
📍 Hokuto, JP: #10 of 35 inventorsTop 30%
Overall (All Time): #344,058 of 4,157,543Top 9%
14
Patents All Time

Issued Patents All Time

Showing 1–14 of 14 patents

Patent #TitleCo-InventorsDate
11404269 Single crystal substrate with undulating ridges and silicon carbide substrate Noriyasu Kawana 2022-08-02
11142821 Method for producing single crystal substrate having a plurality of grooves using a pair of masks Noriyasu Kawana 2021-10-12
9882010 Silicon carbide substrate and method for producing silicon carbide substrate 2018-01-30
9758902 Method for producing 3C-SiC epitaxial layer, 3C-SiC epitaxial substrate, and semiconductor device Noriyasu Kawana 2017-09-12
9732439 Method of forming a laminate of epitaxially grown cubic silicon carbide layers, and method of forming a substrate-attached laminate of epitaxially grown cubic silicon carbide layers 2017-08-15
9536954 Substrate with silicon carbide film, semiconductor device, and method for producing substrate with silicon carbide film 2017-01-03
9362368 Substrate with silicon carbide film, method for producing substrate with silicon carbide film, and semiconductor device 2016-06-07
9064802 Method of manufacturing semiconductor device and semiconductor device having oxide film crystallized by a thermal treatment 2015-06-23
8986464 Semiconductor substrate and method for producing semiconductor substrate 2015-03-24
8847236 Semiconductor substrate and semiconductor substrate manufacturing method 2014-09-30
7968396 Semiconductor device and manufacturing method of the semiconductor device Shinji Migita, Nobuyuki Mise 2011-06-28
7947560 Method of nickel disilicide formation and method of nickel disilicate source/drain formation Nobuyuki Mise, Shinji Migita 2011-05-24
7713884 Method of manufacturing semiconductor device that includes forming metal oxide film on semiconductor wafer Hiromi Ito, Yuuichi Kamimuta, Shinji Migita 2010-05-11
7645655 Semiconductor device and manufacturing method of the semiconductor device Shinji Migita, Nobuyuki Mise 2010-01-12