Issued Patents All Time
Showing 51–68 of 68 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6945641 | Ink cartridge | Hisashi Miyazawa, Satoshi Shinada | 2005-09-20 |
| 6929363 | Ink cartridge vacuum package and ink cartridge vacuum packaging method | Satoshi Shinada, Koichi Toba | 2005-08-16 |
| 6905199 | Ink cartridge for ink jet recording device | Hisashi Miyazawa, Satoshi Shinada, Atsushi Kobayashi | 2005-06-14 |
| 6863376 | Ink cartridge and ink-jet recording apparatus | Takeo Seino, Satoshi Shinada, Hisashi Miyazawa, Masaki Shimomura, Satoshi Nakata | 2005-03-08 |
| 6802602 | Ink cartridge and ink jet record apparatus using ink cartridge | Kenji Tsukada, Satoshi Shinada | 2004-10-12 |
| 6722762 | Ink-jet recording device and ink cartridge | Hisashi Miyazawa, Satoshi Shinada | 2004-04-20 |
| D482061 | Ink cartridge for printer | Satoshi Shinada, Tomio Yokoyama, Kazuhiro Hashii | 2003-11-11 |
| D481756 | Ink cartridge for printer | Satoshi Shinada, Tomio Yokoyama, Kazuhiro Hashii | 2003-11-04 |
| D466151 | Ink cartridge for printer | Satoshi Shinada, Hisashi Miyazawa | 2002-11-26 |
| D465516 | Ink cartridge for printer | Satoshi Shinada, Hisashi Miyazawa | 2002-11-12 |
| 6399212 | Silicon dioxide-coated polyolefin resin and process for its production | Yasuhiro Saito, Hiroyuki Inomata | 2002-06-04 |
| 6291074 | Heat-radiation reflective glass | Koichi Ataka | 2001-09-18 |
| 6231924 | Method of partially forming oxide layer | Koichi Sakaguchi, Shigeki Nakagaki | 2001-05-15 |
| 6075490 | Window glass for automobile and window structure of automobile using the glass | Koichi Sakaguchi, Shigeki Nakagaki, Akihiro Hishinuma, Yukihito Nagashima | 2000-06-13 |
| 5861930 | Color liquid crystal substrate and a manufacturing method thereof | — | 1999-01-19 |
| 5326720 | Method for producing silicon dioxide film which prevents escape of Si component to the environment | Takuji Goda, Akihiro Hishinuma, Hideo Kawahara, Shigehito Deki | 1994-07-05 |
| 5153035 | Process for forming silica films | Shigeo Hayashi, Akihiro Hishinuma, Akihide Sano, Shigehito Deki | 1992-10-06 |
| 5132140 | Process for depositing silicon dioxide films | Takuji Goda, Hirotsugu Nagayama, Hideo Kawahara, Akihiro Hishinuma | 1992-07-21 |