Issued Patents All Time
Showing 1–19 of 19 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7306896 | Electron beam duplication lithography method | — | 2007-12-11 |
| 7011927 | Electron beam duplication lithography method and apparatus | — | 2006-03-14 |
| 6849856 | Electron beam duplication lithography method and apparatus | — | 2005-02-01 |
| 5504037 | Method of forming optimized thin film metal interconnects in integrated circuit structures of apparatus to reduce circuit operational delay | — | 1996-04-02 |
| 5327011 | Semiconductor device with enhanced via or contact hole connection between an interconnect layer and a connecting region | — | 1994-07-05 |
| 5294821 | Thin-film SOI semiconductor device having heavily doped diffusion regions beneath the channels of transistors | — | 1994-03-15 |
| 5258219 | Optimized thin film metal interconnects in integrated circuit structures of apparatus to reduce circuit operational delay | — | 1993-11-02 |
| 5179426 | Josephson device | — | 1993-01-12 |
| 5142640 | Trench gate metal oxide semiconductor field effect transistor | — | 1992-08-25 |
| 5119170 | Thin film metal interconnects in integrated circuit structures to reduce circuit operation speed delay | — | 1992-06-02 |
| 5071832 | Field effect type Josephson transistor | — | 1991-12-10 |
| 4902897 | Ion beam gun and ion beam exposure device | — | 1990-02-20 |
| RE33096 | Semiconductor substrate | — | 1989-10-17 |
| 4576851 | Semiconductor substrate | — | 1986-03-18 |
| 4538291 | X-ray source | — | 1985-08-27 |
| 4404236 | High pressure chemical vapor deposition | Shoichi Komatsu | 1983-09-13 |
| 4401738 | X-Ray lithography mask | — | 1983-08-30 |
| 4348804 | Method of fabricating an integrated circuit device utilizing electron beam irradiation and selective oxidation | Mitsuru Ogawa | 1982-09-14 |
| 4231657 | Light-reflection type pattern forming system | — | 1980-11-04 |