Issued Patents All Time
Showing 51–64 of 64 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6838766 | Semiconductor device | Isao Ogura, Makoto Akizuki, Atsushi Sakai | 2005-01-04 |
| 6831015 | Fabrication method of semiconductor device and abrasive liquid used therein | Yoshio Okayama | 2004-12-14 |
| 6825132 | Manufacturing method of semiconductor device including an insulation film on a conductive layer | Hideki Mizuhara | 2004-11-30 |
| 6794283 | Semiconductor device and fabrication method thereof | Hiroyuki Watanabe, Hideki Mizuhara, Shinichi Tanimoto, Atsuhiro Nishida, Yoshikazu Yamaoka | 2004-09-21 |
| 6617240 | Method of fabricating semiconductor device | Naoteru Matsubara, Hidetaka Nishimura, Hideki Mizuhara | 2003-09-09 |
| 6380064 | Semiconductor devices and process for producing the same | Hideki Mizuhara, Shinichi Tanimoto, Hiroyuki Watanabe | 2002-04-30 |
| 6342440 | Method for forming low-leakage impurity regions by sequence of high-and low-temperature treatments | Kazuhiro Sasada, Shinichi Tanimoto, Atsuhiro Nishida, Yoshikazu Ibara | 2002-01-29 |
| 6008141 | Semiconductor device and fabrication method thereof | Yoshikazu Ibara | 1999-12-28 |
| 5898221 | Semiconductor device having upper and lower wiring layers | Hideki Mizuhara, Shinichi Tanimoto, Hiroyuki Watanabe | 1999-04-27 |
| 5895265 | Semiconductor device having cap-metal layer | Kazutoshi Tsujimura, Shinichi Tanimoto, Yasuhiko Yamashita, Kiyoshi Yoneda, Yoshikazu Ibara | 1999-04-20 |
| 5892269 | Semiconductor device including an intrusion film layer | Hideki Mizuhara | 1999-04-06 |
| 5635763 | Semiconductor device having cap-metal layer | Kazutoshi Tsujimura, Shinichi Tanimoto, Yasuhiko Yamashita, Kiyoshi Yoneda, Yoshikazu Ibara | 1997-06-03 |
| 4906594 | Surface smoothing method and method of forming SOI substrate using the surface smoothing method | Kiyoshi Yoneda, Kazunobu Mameno, Keita Kawahara | 1990-03-06 |
| 4882300 | Method of forming single crystalline magnesia spinel film | Hiroshi Hanafusa | 1989-11-21 |