HP

Hyeon PARK

Samsung: 11 patents #12,136 of 75,807Top 20%
Overall (All Time): #436,541 of 4,157,543Top 15%
11
Patents All Time

Issued Patents All Time

Showing 1–11 of 11 patents

Patent #TitleCo-InventorsDate
12313974 Resist underlayer composition, and method of forming patterns using the composition Jaeyeol BAEK, Soonhyung Kwon, Minsoo Kim, Shinhyo BAE, Daeseok SONG +1 more 2025-05-27
12130552 Composition for resist underlayer, and pattern forming method using same Yoojeong CHOI, Soonhyung Kwon, Minsoo Kim, Shinhyo BAE, Jaeyeol BAEK 2024-10-29
11987561 Resist underlayer composition, and method of forming patterns using the composition Yoojeong CHOI, Soonhyung Kwon, Jaeyeol BAEK, Minsoo Kim, Shinhyo BAE +2 more 2024-05-21
11982943 Method of forming patterns using resist underlayer composition Jaeyeol BAEK, Shinhyo BAE, Yoojeong CHOI, Soonhyung Kwon 2024-05-14
11698587 Resist underlayer composition, and method of forming patterns using the composition Shinhyo BAE, Soonhyung Kwon, Jaeyeol BAEK, Beomjun JOO, Yoojeong CHOI 2023-07-11
11675271 Resist underlayer composition, and method of forming patterns using the composition Jaeyeol BAEK, Soonhyung Kwon, Minsoo Kim, Shinhyo BAE, Daeseok SONG +1 more 2023-06-13
11493848 Resist underlayer composition, and method of forming patterns using the composition Soonhyung Kwon, Shinhyo BAE, Jaeyeol BAEK, Beomjun JOO, Yoojeong CHOI +1 more 2022-11-08
11385545 Resist underlayer composition, and method of forming patterns using the composition Jaeyeol BAEK, Shinhyo BAE, Yoojeong CHOI, Soonhyung Kwon 2022-07-12
11249396 Resist underlayer composition, and method of forming patterns using the composition Yoojeong CHOI, Soonhyung Kwon, Shinhyo BAE, Jaeyeol BAEK 2022-02-15
11048169 Resist underlayer composition, and method of forming patterns using the composition 2021-06-29
10732504 Resist underlayer composition, and method of forming patterns using the composition Shinhyo BAE, Soonhyung Kwon, Jaeyeol BAEK, Beomjun JOO, Yoojeong CHOI +1 more 2020-08-04