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Semiconductor device including gate structure having first portion and second portion and method for manufacturing the same |
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Wiring structure having double capping structure, manufacturing method thereof, and integrated circuit chip having the same |
Jaejin Lee, Hana Kim, Jaewha Park |
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Method for manufacturing a semiconductor device using a support layer to form a gate structure |
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2023-07-11 |
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Dual gate structure, fabrication method for the same, semiconductor device having the same, and semiconductor device fabrication method |
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2011-05-10 |
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Dual gate structure, fabrication method for the same, semiconductor device having the same |
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2009-12-22 |
