Issued Patents All Time
Showing 1–1 of 1 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10319590 | Method of forming semiconductor device using metal-containing hardmask to pattern photoresist having protected polymer | Hyun-Woo Kim, Youn-Joung Cho, Jin-Kyu Han | 2019-06-11 |