AJ

Alum Jung

Samsung: 14 patents #9,740 of 75,807Top 15%
Overall (All Time): #330,534 of 4,157,543Top 8%
14
Patents All Time

Issued Patents All Time

Showing 1–14 of 14 patents

Patent #TitleCo-InventorsDate
12217958 Method of pre-treating substrate and method of directly forming graphene using the same Keunwook Shin, Janghee Lee, Seunggeol NAM, Hyeonjin Shin, Hyunseok Lim +3 more 2025-02-04
12211744 Method of forming nanocrystalline graphene Keunwook Shin, Hyeonjin Shin, Changseok LEE 2025-01-28
12183783 Stacked structure including two-dimensional material and method of fabricating the stacked structure Kyung-Eun BYUN, Keunwook Shin 2024-12-31
11626282 Graphene structure and method of forming graphene structure Eunkyu Lee, Kyung-Eun BYUN, Hyunjae Song, Hyeonjin Shin, Changhyun KIM +2 more 2023-04-11
11572278 Method of forming graphene Hyeonjin Shin, Keunwook Shin, Changhyun KIM, Seunggeol NAM, Kyung-Eun BYUN +4 more 2023-02-07
11069619 Interconnect structure and electronic device employing the same Seunggeol NAM, Hyeonjin Shin, Keunwook Shin, Changhyun KIM, Kyung-Eun BYUN +4 more 2021-07-20
11034847 Hardmask composition, method of forming pattern using hardmask composition, and hardmask formed from hardmask composition Minsu SEOL, Sangwon Kim, Hyeonjin Shin, Dongwook LEE, Seongjun Park +2 more 2021-06-15
10931209 Energy harvester using triboelectricity and apparatus including the same Jae Young Kim, Kyungeun Byun, Hyeonjin Shin 2021-02-23
10850985 Method of forming nanocrystalline graphene, and device including nanocrystalline graphene Keunwook Shin, Kyung-Eun BYUN, Hyeonjin Shin, Hyunseok Lim, Seunggeol NAM +2 more 2020-12-01
10808142 Method of preparing graphene quantum dot, hardmask composition including the graphene quantum dot obtained by the method, method of forming patterns using the hardmask composition, and hardmask formed from the hardmask composition Sangwon Kim, Minsu SEOL, Hyeonjin Shin, Dongwook LEE, Yunseong LEE +1 more 2020-10-20
10777412 Hardmask composition, method of preparing the same, and method of forming patterned layer by using the hardmask composition Dongwook LEE, Sangwon Kim, Minsu SEOL, Seongjun Park, Hyeonjin Shin +2 more 2020-09-15
10587207 Triboelectric generator using surface plasmon resonance Hyeonjin Shin, Jae Young Kim, Kyung-Eun BYUN 2020-03-10
10551735 Pellicle composition for photomask, pellicle for photomask formed from the pellicle composition, method of forming the pellicle, reticle including the pellicle, and exposure apparatus for lithography including the reticle Seongjun Jeong, Hyeonjin Shin, Sangwon Kim, Seongjun Park, Minsu SEOL +2 more 2020-02-04
10372277 Triboelectric device Kyung-Eun BYUN, Jae Young Kim, Hyeonjin Shin 2019-08-06