HS

Hyun-Koock Shin

Rohm And Haas: 4 patents #540 of 2,359Top 25%
RH Rohn And Haas: 1 patents #1 of 38Top 3%
UC Up Chemical Co.: 1 patents #11 of 26Top 45%
Samsung: 1 patents #49,284 of 75,807Top 70%
📍 Seoul, KR: #8,011 of 39,741 inventorsTop 25%
Overall (All Time): #748,522 of 4,157,543Top 20%
7
Patents All Time

Issued Patents All Time

Showing 1–7 of 7 patents

Patent #TitleCo-InventorsDate
7985450 Method for thin film vapor deposition of a dialkyl amido dihydroaluminum compound Bum-Soo Kim, Jin Sik Kim, Jun Young Kim, Young Seop Kim, Bo Yearn Cho 2011-07-26
6500250 Compounds for forming alumina films using chemical vapor deposition method and process for preparing the compound 2002-12-31
6399772 Aluminum complex derivatives for chemical vacuum evaporation and the method of producing the same Hyun-Joo Shin 2002-06-04
6380383 Compound for the aluminum film from chemical vapor deposition and the method of synthesis 2002-04-30
6143357 Aluminum complex derivatives for chemical vacuum evaporation and the method of producing the same Hyun-Joo Shin 2000-11-07
6121443 Compound for the aluminum film from chemical vapor depositions and the method of synthesis 2000-09-19
5501995 Method for manufacturing a gate electrode of a MOS transistor Kyu-Charn Park, Jong Moon, Tae-earn Shim 1996-03-26